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Structural studies of nano/micrometric semiconducting GaInP wires grown by MOCVD

Identifieur interne : 00AC12 ( Main/Repository ); précédent : 00AC11; suivant : 00AC13

Structural studies of nano/micrometric semiconducting GaInP wires grown by MOCVD

Auteurs : RBID : Pascal:05-0081934

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English descriptors

Abstract

3D (Ga,In)/GaInP structures were grown on polycrystalline InP substrates by the MOCVD technique. The growth temperature was varied from 600 to 700 °C. Trimethyl-gallium and N2 were, respectively, used as the Ga source and the carrier gas. These newly presented 3D structures have a scepter-like shape and are composed of a long GaInP internal support (rods of tens of μm long and tens of nm diameter) capped by a micrometer size metallic (Ga,In) structure. These structures were characterized by the SEM, EDX and TEM techniques. High-resolution TEM shows that the support rods present a GaInP single crystal structure. A preliminary discussion about the growth step mechanism, based on the VLS model, is also presented.

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Pascal:05-0081934

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<div type="abstract" xml:lang="en">3D (Ga,In)/GaInP structures were grown on polycrystalline InP substrates by the MOCVD technique. The growth temperature was varied from 600 to 700 °C. Trimethyl-gallium and N
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